After a long run, optical lithography is unlikely to be able to pattern chips beyond the 22 nm technology generation and extreme ultraviolet lithography (EUVL)—with a wavelength of only 13.5 nm—is now widely considered the best replacement for optical lithography. However, EUV masks used for sub-22 nm patterning must be free of printing defects, and current metrology tools are generally ineffective at finding defects below 32 nm.
With a total development cost estimated to be over $200 million, producing the tools required to address this gap in infrastructure is far too costly for any single company or industry sector to develop independently, and will require collaborative innovations that address both technology and business needs across multiple industry segments.
Identifying committed suppliers to build small market EUV mask blank inspection hardware followed by at-wavelength imaging and patterned inspection hardware poses a significant challenge, and the only viable solution is to foster industry-wide financial support.
SEMATECH's proven ability to bring together the right partners from across the entire industry is crucial to sustaining the EUV technology roadmap advances. The EUV Mask Infrastructure Partnership connects multiple segments of the EUV supply chain with chip-makers, research consortia and regional governments in an effort to collectively fund the development of the critical metrology tools needed for detecting defects in advanced EUVL masks.
EMI partners benefit from the program through their direct involvement in shaping the development of this critical infrastructure, and the opportunity to capitalize on early access to this breakthrough technology.
The EMI Partnership is open to mask and chip-makers, mask blank suppliers, consortia, and regional governments who want to ensure the availability of cost-effective, manufacturable EUV solutions. To find out more about how your company or organization can participate in the EMI Partnership, please contact email@example.com.
AZ Electronic Materials
Dow Electronic Materials
JSR Micro Corporation
Nissan Chemical Industries
Shin-Etsu Chemical Co.
Sumitomo Chemical Co.