Cleanroom

EUV Mask Blank Exchange Program

SEMATECH's EUV Mask Blank Exchange Program is a collaborative effort between SEMATECH, commercial mask blank suppliers, and Integrated Circuit (IC) manufacturing companies interested in participating in research projects designed to leverage Extreme Ultra Violet (EUV) Lithography developments in the semiconductor industry.

How does it work?

As part of the EUV Mask Blank Project, a limited number of mask blanks are available for interested IC manufacturing companies to acquire and use for their EUV lithography research and development purposes. Based on the Exchange Program participation agreements, these IC companies will then provide SEMATECH and the individual EUV mask blank supplier(s) with the performance data and other material resulting from the use of the mask blanks.

General areas of data may include:

  • Data resulting from EUV mask patterning
  • Data on performance attributes of buffer and absorber materials
  • Data on EUV mask patterning processing
  • Data resulting from mask blank and completed patterned mask repair
  • Data resulting from EUV mask exposures or wafer print testing and mask defect printability studies
  • Data resulting from mask operation and lifetime testing
  • Data resulting from mask cleaning
  • Data resulting from use of EUV mask blanks or patterned masks inspection tooling / metrology tooling experiments. Such evaluation data can be from the following areas:
    • Defect inspection
    • EUV reflectivity
    • Defect aerial image monitoring

Mask blanks will be distributed in "blocks" approximately four times per year. Interested IC companies may apply for blank masks during the open proposal period for each distribution block.

Benefits

Participants in the program benefit from early access to EUV mask blank materials and accelerated research and development efforts. In turn, the EUV Mask Blank Exchange Program also benefits the entire semiconductor industry by providing a broad base of shared knowledge to improve the infrastructure of EUV lithography.

For more information

To find out more about the EUV Mask Blank Exchange Program, including conditions of the program, application procedures, and mask blank distribution dates please contact euv.blanks@sematech.org or send a fax to 1-512-356-3618.

Some restrictions may apply. SEMATECH reserves the right to suspend or terminate this program at any time.