Resist and Materials Development Center
SEMATECH’s Resist and Materials Development Center (RMDC) was opened in April 2009 with the mission to develop resist and materials for 22 nm patterning technologies and beyond. The RMDC comprises both extreme ultraviolet (EUV) exposure capability and a portfolio of sponsored university research programs. TOK is teaming with SEMATECH researchers to develop and demonstrate EUV materials and resists for the 22 nm node and beyond.
RMDC tools include the ASML ADT currently at CNSE, the Exitech MET, and the Lawrence Berkeley National Laboratory MET in Berkeley, CA. Through the RMDC, leading resist and materials suppliers have access to SEMATECH’s two METs and can participate in focused, cooperative R&D with SEMATECH member companies.
With its impressive portfolio of resist research projects employing dozens of academic and industry researchers from around the world, the RMDC provides the hardware and research expertise required by materials suppliers and member companies to develop EUV resist processes to meet the stringent resolution, linewidth roughness, and sensitivity specifications for EUV insertion at member companies.
To expedite and facilitate the transfer of knowledge from research to production, the RMDC has adopted an associate membership model, formalizing the relationship between SEMATECH and resist suppliers.
